热门站点| 世界资料网 | 专利资料网 | 世界资料网论坛
收藏本站| 设为首页| 首页

Xenon DPP source technologies for EUVL exposure tools

作者:科技文献资料网 时间:2018-10-19 11:45:17  浏览:9300   来源:科技文献资料网
下载地址: 点击此处下载
[唯一标识符]:DOI.10.1117/12.814100
[文献来源]:国际光学工程学会数据库
[文献类型]:科技会议
[标题]:Xenon DPP source technologies for EUVL exposure tools
[作者]:Masaki Yoshioka and Denis BolshukhinXTREME technologies GmbH (Germany)Marc CorthoutPhilips Extreme UV GmbH (Germany)Gnther H. DerraPhilips Research (Germany)Sven GtzeXTREME technologies GmbH (Germany)Jeroen JonkersPhilips Extreme UV GmbH (Germany)Jrgen Kl
[文摘]:The learning gained in previous developments for EUV Micro Exposure and Alpha Tools builds the basis for the EUVL source development at XTREME technologies and Philips EUV. Field data available from operation of these tools are in use for continuous impro
[卷]:7271
[会议名称]:Alternative Lithographic Technologies
[会议时间]:17 March 2009
[会议信息]:Tuesday 24 February 2009
[总页数]:8


下载地址: 点击此处下载
[唯一标识符]:CDSTIC.SPIE.6552-032
[文献来源]:国际光学工程学会数据库
[文献类型]:科技会议
[标题]:Time-dependent model of eye-safe erbium-doped YAG laser
[作者]:Bahram Zandi; John B. Gruber; Anmol S. Nijjar; Robert C. Lee; Marly B. Camargo
[文摘]:"We have developed a time dependent model for the eye-safe laser emission at 1.6&mgr;m, representing transitions from the manifolds 4I13/2 to 4I15/2 of trivalent Er-doped YAG (Y3Al5O12). The model is based on a set of coupled first-order differential equa
[卷]:6552
[ISBN]:9780819466747
[会议名称]:Laser Source Technology for Defense and Security III (Proceedings Volume)
[会议时间]:9 May 2007
[会议信息]:Editor(s): Gary L. Wood; Mark A. Dubinskii ISBN: 9780819466747 Date: 9 May 2007
[总页数]:7


[唯一标识符]:CDSTIC.ISTP.609227
[文献来源]:科学技术会议录索引(ISTP)
[文献类型]:科技会议
[标题]:TECHNOLOGY-TRANSFER IN AMERICAN UNIVERSITIES AND CURRENT SITUATION IN THIS SPHERE IN RUSSIA
[作者]:AA SHAPOSHNIKOV
[出版单位]:I E E ENEW YORK
[ISSN_ISBN]:0-7803-6346-9
[会议名称]:7th International Scientific and Practical Conference of Students-Post-Graduates-and-Young-Scientists,TOMSK, RUSSIA,February 26-March 2, 2001
[来源]:MODERN TECHNIQUES AND TECHNOLOGY,pp 187-188
[编辑者]:EAA Sinebryukhov
[地址]:AA SHAPOSHNIKOV,TOMSK_POLYTECH_UNIV, TOMSK, RUSSIA
[专业领域]:ENGINEERING, ELECTRICAL & ELECTRONIC,INSTRUMENTS & INSTRUMENTATION,AUTOMATION & CONTROL SYSTEMS

版权声明:所有资料均为作者提供或网友推荐收集整理而来,仅供爱好者学习和研究使用,版权归原作者所有。
如本站内容有侵犯您的合法权益,请和我们取得联系,我们将立即改正或删除。
信息产业部备案号:京ICP备09025792号